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真空等离子清洗原理Principle of vacuum plasma cleaning

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真空等离子清洗原理Principle of vacuum plasma cleaning

发布日期:2021-04-17 作者: 点击:

真空等离子清洗原理

QQ图片20210417113353.png

    等离子体是物质的一种存在状态,通常物质以固态、液态、气态三种状态存在,但在一些特殊的情况下有第四种状态存在,如地球大气中电离层中的物质。等离子体状态中存在下列物质:处于高速运动状态的电子;处于激活状态的中性原子、分子、原子团(自由基);离子化的原子、分子;未反应的分子、原子等,但物质在总体上仍保持电中性状态。


    在真空腔体里,通过射频电源在一定的压力情况下起辉产生高能量的无序的等离子体,通过等离子体轰击被清洗产品表面.以达到清洗目的。

                                                                           Principle of vacuum plasma cleaning

    Plasma is an existing state of matter. Usually, matter exists in three states: solid state, liquid state and gas state, but in some special cases, there is a fourth state, such as the material in the ionosphere in the earth's atmosphere. The following substances exist in the plasma state: electrons in high-speed motion; Neutral atoms, molecules and atomic groups (free radicals) in the activated state; Ionized atoms and molecules; Unreacted molecules, atoms, etc., but the substance remains electrically neutral as a whole.


    In the vacuum chamber, high-energy disordered plasma is generated by RF power supply under certain pressure, and the cleaned product surface is bombarded by plasma to achieve the purpose of cleaning.


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