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Why cant the development of etching machine always show through?蚀刻机腐蚀技术之为什么有时显影总显不透?

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Why cant the development of etching machine always show through?蚀刻机腐蚀技术之为什么有时显影总显不透?

发布日期:2018-11-02 作者:www.cycas.com 点击:

  金属等离子刻蚀机蚀刻技术在制作网版的过程中,有时在图文部分往往出现显影不透的现象,主要有以下几个方面的原因:

  一. 是在恒温箱中烘干网版的时间太长或烘干的温度太高,两者都可使涂布感光胶的网版在没有曝光之前就产生“热敏化” ,如果再曝光就产生过量曝光,因此,图像难以显透了。

  二. 在涂布感光胶时,由于涂布的次数较多,涂布时又不注意避光操作造成多次曝光,再曝光时就难以显透图像。

  三. 晒版光源强度太大,晒版时间太长造成曝光过度,造成显影困难。有时图像反差太小,曝光时就会产生曝光过度,造成显影困难。

In the process of making screen plate, sometimes the picture and text part of the etching technology of metal plasma etcher often appears the phenomenon of developing impervious. The main reasons are as follows:

    first, the drying time of screen plate in the incubator is too long or the drying temperature is too high, both of which can make the screen plate coated with photosensitive adhesive produce "heat sensitivity" before it is exposed If re exposed, it will cause over exposure, so the image is difficult to show through.

    Second、 In the coating of photoresist, due to the number of times of coating, coating and do not pay attention to the operation of avoiding light, resulting in multiple exposures, re exposure is difficult to show through the image.

    Third、 The intensity of the light source is too large, and the exposure time is too long, which makes the development difficult. Sometimes the image contrast is too small, the exposure will produce overexposure, resulting in development difficulties.


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