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什么公司会用到等离子刻蚀机What company will use plasma etching machine

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什么公司会用到等离子刻蚀机What company will use plasma etching machine

发布日期:2018-02-01 作者:www.cycas.com 点击:

从某种程度来讲,等离子清洗实质上是等离子体刻蚀的一种较轻微的情况。进行干式蚀刻工艺的设备包括反应室、电源、真空部分。工件送入被真空泵抽空的反应室。气体被导入并与等离子体进行交换。等离子体在工件表面发生反应,反应的挥发性副产物被真空泵抽走。

等离子刻蚀机实际上便是一种反应性等离子工艺。近期的发展是在反应室的内部安装成搁架形式,这种设计的是富有弹性的,用户可以移去架子来配置合适的等到离子体的蚀刻方法:反应性等离子体(RIE),顺流等离子体(downstream),直接等离子体(direction plasma)。 

所谓直接等离子体,亦称作反应离子蚀刻,是等离子的一种直接浸蚀形式。它的主要优势是高的蚀刻率和高的均匀性。直接等离子体具有较低浸蚀但工件却暴露在射线区。顺流等离子是种较弱的工艺,它适合去除厚为10-50埃的薄层。在射线区或等离子中,人们担心工件受到损坏,目前,这种担心还没有证据,看来只有在重复的高射线区和延长处理时间到60-120分钟才可能发生,正常情况下,这样的条件只在大的薄片及不是短时的清洗中。

To some extent, plasma cleaning is actually a slight case of plasma etching. Equipment for dry etching process includes reaction chamber, power supply and vacuum part. The workpiece is sent to the reaction chamber which is evacuated by the vacuum pump. The gas is introduced and exchanged with the plasma. The plasma reacts on the surface of the workpiece, and the volatile by-products are pumped away by vacuum pump.

 Plasma etcher is actually a reactive plasma process. The recent development is to install the reaction chamber in the form of a shelf. This kind of design is elastic. Users can remove the shelf to configure appropriate etching methods until the ionomer: reactive plasma (RIE), downstream plasma (downstream), direct plasma (direction plasma). 

The so-called direct plasma, also known as reactive ion etching, is a direct form of plasma etching. Its main advantages are high etching rate and high uniformity. The direct plasma has low etching but the workpiece is exposed to the radiation region. The downstream plasma is a weak process, which is suitable for removing the thin layer with thickness of 10-50 a. In the radiation area or plasma, people are worried about the damage of the workpiece. At present, there is no evidence for this concern. It seems that it can only happen in the repeated high-ray area and extended processing time to 60-120 minutes. Under normal circumstances, such conditions are only in large flakes and not in short-term cleaning.

等离子刻蚀机

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