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Magnetron sputtering (磁控溅射台))

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What is intermediate frequency magnetron sputtering?

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What is intermediate frequency magnetron sputtering?

发布日期:2018-02-01 作者: 点击:

     在中频反应溅射中,当靶上所加的电压处于负半周时,靶面被正离子溅射;而在正半周时,等离子体中的电子被加速到靶面,中和了靶面上积累的正电荷,从而抑制了打火。但在确定的工作场强下,频率越高,等离子体中正离子被加速的时间越短,正电场从外电场吸收的能量越少,轰击靶的正离子能量越低,靶的溅射速率也降低。由于溅射电压的频率范围处于10~80KHz范围,因此又叫中频溅射']

磁控溅射台

     磁控溅射台中频溅射常用于溅射两个靶,通常为并排的两个靶,尺寸和外形全部相同,因此这两个靶常称为孪生靶。孪生靶在溅射室中悬浮安装,在溅射过程中,两个靶周期性轮流作为阴极与阳极,既抑制了打火,而且由于消除了普通直流反应磁控溅射中的阳极消失现象,从而使溅射过程得以稳定进行。 

   In the intermediate frequency reactive sputtering, when the applied voltage on the target is in the negative half cycle, the target surface is sputtered by positive ions; in the positive half cycle, the electrons in the plasma are accelerated to the target surface, neutralizing the positive charge accumulated on the target surface, thus inhibiting the ignition. However, at a certain working field strength, the higher the frequency, the shorter the acceleration time of the positive ions in the plasma, the less the energy absorbed by the positive electric field from the external electric field, the lower the energy of the positive ions bombarding the target, and the lower the sputtering rate of the target. Because the frequency range of sputtering voltage is in the range of 10-80khz, it is also called if sputtering .

Magnetron sputtering table

   The medium frequency sputtering of magnetron sputtering platform is often used to sputter two targets, usually two targets side by side, with the same size and shape. Therefore, these two targets are often called twin targets. The twin targets are suspended in the sputtering chamber. In the sputtering process, the two targets are alternately used as cathodes and anodes, which not only suppress the ignition, but also eliminate the disappearance of anodes in the DC reactive magnetron sputtering, so that the sputtering process can be carried out stably.


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